Sputtering coating machine usually consists of vacuum chamber, target material, substrate frame, working gas conveying system, power supply and control system, etc. In the vacuum chamber, gas is evacuated to create a vacuum environment and avoid interference from gas molecules during the sputtering process. The target material is a key component of the sputtering coating machine, usually made of the required material, which is heated and excited by electric arcs, ion beams, or magnetic fields to achieve atomic or molecular sputtering.

In the context of today's rapidly changing technological development, the importance of material surface treatment technology is increasingly prominent. Sputtering coating machine, as an advanced surface treatment technology equipment, has received widespread attention due to its unique principles and wide application fields. This article will provide a detailed introduction to the principle, application, and market trends of sputtering coating machines.